Interference Lithography is an optical nanolithography technology for the fabrication of large area periodic nanostructures. Critical dimensions of less than 50 nm can be realised.

At AMO we have two Interference Lithography systems installed. One setup for large area and fixed periods and one adjustable setup for small exposure area.

We offer grating fabrication on silicon, silicon dioxide and other substrates with tailored pitch, etch depth and size.

The exposure of 6" (150 mm) wafers requires a large optical table (2,5m x 4m), robust optical components and active fringe stabilisation to compensate unavoidable vibration and noise causing phase modulation in the interferometer.

At AMO we have solved these problems and operate a 266 nm beam line with a fringe stabilisation system with a digital PID controller based on our Saturn System.