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AMO GmbH |January 12, 2011

 

 

AMO Newsletter 1/2011

Dear Reader,

 

We are proud to present our first newsletter about AMO’s exciting activities in the area of nanotechnology. With this AMO newsletter you will continuously be informed about latest research results and the broad portfolio of our research services.

 

In this issue our highlights are mainly focused on recent results on functional surface nanotexturing. This topic has just recently gained strong interest as AMO enforced its partnership in the field of nanoimprint technology. AMO is successfully collaborating with SUSS MicroTec on the development of UV-SCIL – an advanced full-field nanoimprint technology. AMO provides key components for nanoimprint lithography: large-area masters containing micro- and nanostructures and the UV-curing nanoimprint material AMONIL. Enjoy our newsletter and find more details on AMO´s latest developments below.

 

We are looking forward to a successful cooperation in 2011.

Dr.-Ing. Christian Moormann

Managing Director, AMO GmbH

Dr.-Ing. Matthias Baus

Technology Manager, AMO GmbH

 

 

AMO Highlights: UV-Nanoimprint and Nanolithography

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AMO and SUSS MicroTec collaborating in the field of nanoimprint on development of UV-SCIL

AMO has provided two key components for this development: the master for large-area nanostructures and the UV-curing nanoimprint material AMONIL... more more...

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Large area nanogratings with periods from 180 nm up to 2500 nm available now

AMO’s IL technology allows producing large, coherent and periodic gratings with constant pitch. New technology steps enable 1D and 2D nanogratings for a large range of applications... moremore...

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AMO GmbH decided in favour of the Vistec’s Electron-Beam Lithography System EBPG5200

Vistec Lithography announced that AMO has placed an order for Vistec’s electron-beam lithography system EBPG5200. With EBPG5200 a highly flexible and reliable patterning system will be available for nanofabrication services.... more more...

 

 

 

Nanophotonics

 

On the way towards a high-speed silicon DWDM modulator chip

Innolume, RWTH Aachen University and AMO are developing an ultra-high bandwidth DWDM transmitter unit combining Innolume´s comb laser technology and AMO´s silicon nanophotonic platform… more more...

 

Silicon photonics device prototyping line established with European research project (Circles of Light)

An important technical progress highly recognized by the European Commission has been established... more more...

 

“PLATON” - New promising European Research Project on Plasmonics and Silicon Photonics launched in 2010

PLATON is targeting the realization of a fully integrated Terabit per second optical routing system for data networks through merging Plasmonics and Silicon Photonics.... more more...

 

 

 

Graphene

 

Room temperature operation of graphene transistors (FET) demonstrated

Within the EU-funded project „GRAND – Graphene-based Nanoelectronic Devices“ AMO demonstrated a graphene based field effect transistor working at room temperature.... more more...

 

Graphene goes Waferscale

Researchers at AMO were able to develop a special technique for large scale fabrication of graphene layers... more more...

 

First European Symposium on Carbon-based Electronics in Aachen

Within the EU funded project GRAND experts in the field of carbon-electronics came together in Aachen to present their latest scientific results and to discuss future directions for research in Europe....  more more...

NanoCMOS

PULLNANO selected as “Star Project” by the European Commission

The European FP6 project PULLNANO was based on the outcomes of NanoCMOS, with AMO GmbH being involved in both projects. ... more more...

 

AMO reports at VLSI-TSA, Taiwan about the integration of ALD AlN Work Function Tuning Layers

At this year’s Symposium on VLSI-TSA results from the German national project MEGA EPOS have been reported on metal gate work function engineering in MOSFET devices.... more more...

 

 

 

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