AMO offers flexible exposure and development services for gratings in a cleanroom environment on two dedicated actively stabilized interferometres. Pattern transfer and further processing can be carried out according to customer requirements. AMO provides highly spacial coherent gratings from 180 nm up to 2500 nm on several substrate up to 6" all with tailored pitch, etch depth and size.
Applications for holographic Gratings
- Diffraction gratings
- Encoder gratings
- Imprint templates
- Polarizers
- Spectroscopy
- Beam splitting
- Beam scanning
- Laser scanners
- Photonic crystals
- Metrology
- Telecommunication gratings
- Drug discovery
Specification
Interference lithography (IL) is an optical holographic lithography technology where an interference pattern of two ultra violet light beams is recorded in a high resolution photo sensitive material. The periodic patterns are stitch free and spatially coherent over many square centimetres with features smaller than 100 nm. The grating pitch remains constant over the entire area with a deviation of less 0.5 nm. The IL process at AMO is designed for high contrast gratings recorded in standard DUV photo resist suitable for anisotropic pattern transfer. IL is the most suitable lithography for precision gratings.
<Download Interference Lithography Fact Sheet>
Please see also our Grating stock list, which is regularly updated.
Substrate Material | Silicon or fused silica | |
Substrate thickness | Typical 500 µm to 650 µm | |
Substrate size | Up to 6 inch and any rectangular within. (Sometimes 8" possible) | |
Grating pitch | 180 nm to 2500 nm | |
Etch depth | 90 nm to 2500 nm | |
Line width | 40 nm to 1500 nm | |
Active grating area | Up to 140 mm in diameter |
Samples of 2x2 cm are available starting from 500 €
Interference Lithography Gratings Examples
Linear gratings | Image | Substrate | Size | Period | Uniformity | Etching Depth |
ILL500-1 |
| silicon | 6" | 500 | ± 5% | on demand |
ILL180-6 |
| silicon | 6" | 180 | ± 5% | 130 |
ILL513-2 |
| silicon | 6" | 513 | ± 5% | 150 |
ILL180-4 |
| silicon | 6" | 180 | ± 5% | 130 |
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Hole Pattern | Image | Substrate | Size | Period | Uniformity | Etching Depth |
ILH513-6 |
| silicon | 6" | 513 | ± 5% | 200 |
ILH500-4 |
| silicon | 6" | 500 | ± 5% | on demand |
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Post Pattern | Image | Substrate | Size | Period | Uniformity | Etching Depth |
ILP500-4 |
| silicon | 4" | 500 | ± 5% | on demand |
ILP500-6 |
| silicon | 6" | 500 | ± 5% | on demand |
Further holographic gratings with similar specifications are available and could be deep etched on request.
If you are interested in these periodic structures please fill in the request form or contact us directly.
