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Holographic Gratings

AMO offers flexible exposure and development services for gratings in a cleanroom environment on two dedicated actively stabilized interferometres. Pattern transfer and further processing can be carried out according to customer requirements. AMO provides highly spacial coherent gratings from 180 nm up to 2500 nm on several substrate up to 6" all with tailored pitch, etch depth and size.

Applications for holographic Gratings

  • Diffraction gratings
  • Encoder gratings
  • Imprint templates
  • Polarizers
  • Spectroscopy
  • Beam splitting
  • Beam scanning
  • Laser scanners
  • Photonic crystals
  • Metrology
  • Telecommunication gratings
  • Drug discovery

Specification

Interference lithography (IL) is an optical holographic lithography technology where an interference pattern of two ultra violet light beams is recorded in a high resolution photo sensitive material. The periodic patterns are stitch free and spatially coherent over many square centimetres with features smaller than 100 nm. The grating pitch remains constant over the entire area with a deviation of less 0.5 nm. The IL process at AMO is designed for high contrast gratings recorded in standard DUV photo resist suitable for anisotropic pattern transfer. IL is the most suitable lithography for precision gratings.

 

Download Interference Lithography Fact Sheet

 

Please see also our Grating stock list, which is regularly updated.

Substrate Material

Silicon or fused silica

Substrate thickness

Typical 500 µm to 650 µm

Substrate size

Up to 6 inch and any rectangular within. (Sometimes 8" possible)

Grating pitch

180 nm to 2500 nm

Gratings in stock

Etch depth

90 nm to 2500 nm

Line width

40 nm to 1500 nm

Active grating area

Up to 140 mm in diameter

Samples of 2x2 cm are available starting from 500 €

 

Interference Lithography Gratings Examples

Linear gratings

Image

Substrate

Size

Period

Uniformity

Etching Depth

ILL500-1 

silicon

6"

500

± 5%

on demand

ILL180-6

silicon

6"

180

± 5%

130

ILL513-2

silicon

6"

513

± 5%

150

ILL180-4

silicon

6"

180

± 5%

130

 






 

Hole Pattern

Image

Substrate

Size

Period

Uniformity

Etching Depth

ILH513-6

silicon

6"

513

± 5%

200

ILH500-4

silicon

6"

500

± 5%

on demand


 







Post Pattern

Image

Substrate

Size

Period

Uniformity

Etching Depth

ILP500-4

silicon

4"

500

± 5%

on demand

ILP500-6

silicon

6"

500

± 5%

on demand

 

Further holographic gratings with similar specifications are available and could be deep etched on request.

If you are interested in these periodic structures please fill in the request form or contact us directly.

 

More Information: