AMO provides fabrication and development services for UV nanoimprint with quartz templates and soft-UV nanoimprint with elastomeric templates. AMO offers the integration of imprint material, templates and tools with customer-oriented process development.
In-house fabrication for high resolution quartz, elastomeric templates and UV-curable imprint resists can be supplied. Based on our profound equipment configuration we can offer up to full 6” wafer or 6”..8” step & repeat.
We support you in:
- Process development
- Template fabrication
- Nanoimprint resist
- Nanofabrication
- CMOS-Prototyping by NIL
- Electronic and Photonic device prototyping
- Technology evaluation and consulting
- Low-volume production
- Resist material evaluation
Interested in our processing and technology services?
Then please fill in the request form or contact us directly.
Nanoimprint Foundry Services
AMO offers its long-term experience in nanoimprint technology. We are developing processes and applications using soft-UV nanoimprint.
Soft UV NIL |
| Imprint resolution limit down to 20 nm |
Masters and Templates
We offer standard and customized template fabrication. Based on our high resolution E-beam technology we are able to realise templates with dimensions down to 30 nm. We offer solutions for several imprint tools. For S&R UV nanoimprint we provide quartz glass templates. For soft UV nanoimprint and micro contact printing we offer silicon master fabrication and PDMS replication up to 6".
grating pattern |
| patterned area |
microscale pattern |
| arbitrary pattern with etching |
Imprint Resist
AMONIL is the result of our long-standing experience in UV nanoimprint. It is designed for spin-coating imprint processes using quartz or PDMS templates. We offer the resist material in different thicknesses in 50, 100 and 500 ml bottles.
AMONIL |
| UV curable low viscosity imprint resist material |
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