UV nanoimprint is a relatively new lithography technology for the fabrication of nanoscale structures in nanoelectronics, photonics and biotechnology. It competes with DUVL or EUVL, works, however, with only a fraction of the costs but higher resolution.

The basic idea is to replicate a pattern etched into a template by pressing it into a low viscous UV light curable resist. After the resist has filled the cavity of the template, UV light is shined through it to harden the resist. In the last step the template is removed and three-dimensional replication of the structures remains in the resist film. Further anisotropic etching can be used to transfer the nanostructures into a substrate.

Advantages of nanoimprint lithography

• nanolithography with resolution better than 10 nm
• Resolution only limited by the template
• Low cost of ownership
• three-dimensional pattern capabilities to reduce fabrication costs
• Room temperature operation and low imprint force
• High accuracy alignment down to 20 nm
• Imprint in reduced ambient air pressure for low defectiveness
• Material basis (AMONIL) with integrated anti-sticking properties