The Emerging Nanopatterning Methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features.

The NaPa consortium complements the deep UV technology by providing low-cost scalable processes and tools to cover the needs of nanopatterning from CMOS back-end processes through photonics to biotechnology. Research is undertaken in three technology strands: nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.

NaPa brings together 35 leading academic and industrial European institutions with a vast amount of recent know-how on nanofabrication, partly developed within FP5.

For more Information please refer to the project webpage: