AMO provides wafers coated with a variety of layers
Wafer materials:
- silicon
- quarz
- sapphire
- fused silica
- glass
- further substrates
Layer materials:
- silicon nitride (LPCVD)
- silicon oxide (wet or dry thermal oxidation, LPCVD)
- various metal and insulating layers by CVD, PVD or ALD
We also provide micro- and nanostructuring by:
- optical lithography
- electron beam lithography
- nanoimprint lithography
Prices and further details on request.
Quantity | Substrate | Size | Layer | Thickness |
6 | silicon | 6" | silicon nitride | 100 nm |
1 | silicon | 4" | silicon nitride | 300 nm |
11 | silicon | 6" | silicon oxide | 200 nm |
15 | silicon | 4" | silicon oxide | 520 nm |
If you are interested in wafers or our processing/nanotechnology services please fill in the request form or contact us directly.
