Conference on Fabrication of Nanostructures
For nine years, the NILindustrialday has been regarded as the most important international event for users of NanoImprint Lithography (NIL). The conference, which is expected to attract more than 150 participants from Europe, Asia and the USA will take place from 28 to 29 March 2019 at SuperC of RWTH Aachen University. The event will be hosted by AMO GmbH in cooperation with micro resist technology GmbH and Profactor GmbH.
Professor Matthias Wessling, Prorector for Research and Structure at RWTH Aachen University, Gabi Grützner, Managing Director of micro resist technology GmbH and Dr. Michael Hornung, Managing Director of AMO GmbH, will open the event.
First and foremost, the NILindustrialday will focus on the existing application possibilities of NIL and related technologies for series production as well as on new technological approaches. NIL describes a process for the production of nanostructures for electronic and opto-electronic devices using a nanostructured stamp.
This year’s conference will highlight the application areas of life sciences, optics & photonics, 3D patterning and mastering as well as the global perspectives of nanoimprint lithography. The conference thus serves users and researchers as a common platform for discussions and information exchange. The target group essentially comprises all technology users and process service providers in the field of NIL, companies that are evaluating the use of NIL or that need new expanded possibilities, as well as universities and research institutions that are further developing existing technologies.
Further information and registration can be found at www.nil-industrialday.org.
Conference Chair: Dr. Michael Hornung
AMO GmbH Aachen
Tel. +49 (0) 241 – 88 67 200