Research

Nanostructuring

The ability to manufacture components with critical dimensions in the range of a few nanometers is the basis for research into new device concepts and innovative materials. At AMO, we are constantly developing and expanding our equipment and know-how for manufacturing components at the nanoscale.

Our technology platform enables us to react quickly and flexibly to new technical developments. We are constantly optimizing our nanostructuring processes, always keeping in mind the need for a high degree of compatibility with industrial manufacturing processes and the scalability to large production volumes.

Group Leader: Dr. Ing. Jens Bolten

Contact

Dr.-Ing. Jens Bolten

Group Leader - Nanostructuring


A highly flexible technology platform

Our technology platform is based on different lithographic methods that can be flexibly combined to define lithographic patterns with very high precision. We use optical lithography for low-cost patterning, laser interference lithography for patterning periodic structures, and electron beam lithography for the highest resolution.

Each lithographic method is tailored to a specific pattern transfer process and can be used on a variety of substrates, from conventional silicon wafers to glass substrates and flexible substrates.

In addition, we have developed an advanced nanoimprint lithography process that can be used to transfer patterns defined by e-beam onto large areas in a cost-effective manner.

“The more challenging a patterning request is, the more interested we are in giving it a try.”

Running projects

Concluded projects

Förderer Funding Agency:
  • Alle
  • BMBF
  • BMFTR
  • BMFTR, EU
  • BMWE
  • BMWi
  • BMWK
  • DFG
  • EFRE NRW
  • EU
  • Land NRW