A highly flexible technology platform
Our technology platform is based on different lithographic methods that can be flexibly combined to define lithographic patterns with very high precision. We use optical lithography for low-cost patterning, laser interference lithography for patterning periodic structures, and electron beam lithography for the highest resolution.
Each lithographic method is tailored to a specific pattern transfer process and can be used on a variety of substrates, from conventional silicon wafers to glass substrates and flexible substrates.
In addition, we have developed an advanced nanoimprint lithography process that can be used to transfer patterns defined by e-beam onto large areas in a cost-effective manner.