AMONIL®: High performance UV nanoimprint resist
UV Nanoimprint is a mechanical molding technique. A template made from quartz or a flexible elastomer with a 3D relief is brought into intimate contact with a UV-curable resist spin-coated on top of a substrate. Applying low imprint pressure at room temperature features are filled within seconds due to the low viscosity of the imprint resist. The resist is hardened via UV-light through the backside of the template. Finally, substrate and template are separated. The replicated resist relief can further be transferred into the substrate via RIE-process or used as functional element.
Based on the extensive long lasting experience in the field of nanoimprint AMO developed an UV-curable resist (AMONIL®) and a matching adhesion promoter (AMOPRIME) which are commercially available.
AMO’s nanoimprint resist AMONIL®:
AMO GmbH has been engaged in research and development of UV-Nanoimprint Lithography within an array of projects for over 15 years. Based on this wealth of experience we were able to design AMONIL® and improve it on a regular basis. The resist combines outstanding coating and imprinting properties with excellent pattern fidelity and a reasonable plasma stability.
The main characteristics of AMONIL®:
- Base material viscosity: 50mPa s
- Photo initiator designed for UV-curing
- Capability for step&repeat cycles > 1000 imprints demonstrated
- Exposure dose: 2J/cm² using quartz mold
- Applied by standard spin-coating process
- Usable with quartz, PDMS and PFPE molds
- Good adhesion to silicon substrates
- Average adhesion to SiO2, Ti, Au, PE
- Adhesion is vastly improved using AMOPRIME for substrate preparation
- Use of AMOPRIME allows imprinting on GaAs, GaN, InP, Al2O3
- AMONIL available in three versions with film thicknesses ranging from 100 to 800 nm
- AMOPRIME available as adhesion promoter
For more information please refer to the FactSheet AMONIL® on the right-hand side or make direct contact for a concrete proposal.