AMO

Publications

Below you find AMO’s publications resulting from the scientific effort in the different fields of research spanning the time period from 1997 till today. Use the filter to find the publications matching your interest.

Overview of AMO Publications_2014-2019

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High Resolution lithography with PDMS-molds


Topic: Nanoimprint Lithography
Publication Type: Conference Presentation
M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz
Source: EIPBN San Diego 2004

2004

High resolution lithography with PDMS molds


Topic: Nanoimprint Lithography
Publication Type: Article
M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner and F. Lindner (EV Group).
Source: Journal of Vacuum Science & Technology B, Vol. 22 (6) 2004, pp. 3229-3232

2004

Electron Beam Lithography for Applications in Nanotechnology


Topic: Electron Beam Lithography
Publication Type: Conference Presentation
T. Wahlbrink
Source: Ultimate Lithography and Nanodevice Engineering, June 13-16, Agelonde/France, 2004

2004

Electrical characterization of 12 nm EJ-MOSFETs on SOI substrates


Topic: Nanoelectronics
Publication Type: Article
W. Henschel, T. Wahlbrink, Y.M. Georgiev, M. Lemme, T. Mollenhauer, B. Vratzov, A. Fuchs, H. Kurz, M. Kittler, F. Schwierz.
Source: Vacuum, Vol. 77 2005, pp. 117-123

2004

Comparison of Metal Gate Electrodes on MOCVD HfO2


Topic: Nanoelectronics
Publication Type: Conference Presentation
M.C. Lemme, J. K. Efavi, T. Mollenhauer, T. Wahlbrink, H.D.B. Gottlob, H. Kurz
Source: Workshop on Dielectrics in Microelectronics, WODIM 2004, June 28-30, Cork/Ireland, 2004

2004

CMOS Process Sequence for Evaluation of Crystalline High-K Gate Dielectrics


Topic: Nanoelectronics
Publication Type: Conference Presentation
H.D.B. Gottlob, M.C. Lemme, T. Mollenhauer, J.K. Efavi, T. Wahlbrink, H. Kurz
Source: Proceedings of 5th European Workshop on Ultimate Integration of Silicon, ULIS 2004, 11-12.03.2004 Leuven/Belgium, 2004

2004

CMOS Process Sequence for Evaluation of Crystalline High-K Gate Dielectrics


Topic: Nanoelectronics
Publication Type: Conference Proceedings
H.D.B. Gottlob, M.C. Lemme, T. Mollenhauer, J.K. Efavi, T. Wahlbrink, H. Kurz
Source: Proceedings of 5th European Workshop on Ultimate Integration of Silicon, ULIS 2004, Leuven, Belgium March 11-12, 2004

2004

Fabrication of Monolithic Bidirectional Switch (MBS) Devices”


Topic: Nanoelectronics
Publication Type: Article
M. Baus, M.C. Lemme, S. Chmielus, R. Sittig, B. Spangenberg, H. Kurz
Source: Microelectronic Engineering, Vol 73-74 2004, pp. 463-467

2004

vapor deposited release layers for nanoimprint lithography


Topic: Nanoelectronics
Publication Type: Article
M. Lemme, T. Mollenhauer, W. Henschel, T. Wahlbrink, M. Heuser, M. Baus, O. Winkler, R. Granzner, F. Schwierz, B. Spangenberg, H. Kurz
Source: Microelectronic Engineering, Vol. 67-68, pp. 810-817, 2003.

2003

vapor deposited release layers for nanoimprint lithography


Topic: Electron Beam Lithography, Nanophotonics
Publication Type: Conference Proceedings
A. Vörckel, M. Mönster, P. Haring Bolivar, W. Henschel, H. Kurz
Source: Conference Proceedings CLEO 2003, 1-6.06.2003, Baltimore/USA 2003

2003

Triple-Gate MOSFETs fabricated with Interference Lithography


Topic: Interference Lithography, Nanoelectronics
Publication Type: Conference Presentation
M. Lemme, C. Moormann, H. Lerch, M. Möller, B. Vratzov, H. Kurz.
Source: TNT 2003, Salamanca/Spain, September 15-19, 2003.

2003

Subthreshold Characteristics of p-type Triple-Gate MOSFETs


Topic: Nanoelectronics
Publication Type: Conference Presentation
M. Lemme, T. Mollenhauer, W. Henschel, T. Wahlbrink, H. Gottlob, J. Efavi, M. Baus, O. Winkler, B. Spangenberg, H. Kurz
Source: European Solid State Devices Research Conference, ESSDERC 2003, Estoril/Portugal, September 2003

2003

Subthreshold Characteristics of p-type Triple-Gate MOSFETs


Topic: Nanoelectronics
Publication Type: Conference Proceedings
M. Lemme, T. Mollenhauer, W. Henschel, T. Wahlbrink, H. Gottlob, J. Efavi, M. Baus, O. Winkler, B. Spangenberg, H. Kurz
Source: Proceedings of ESSDERC 2003

2003

Study of a high contrast process for hydrogen Silsesquioxane as a negative tone electron beam resist


Topic: Electron Beam Lithography
Publication Type: Article
W. Henschel, Y.M. Georgiev and H. Kurz
Source: Journal of Vacuum Science & Technology, Vol. 21 (5) 2003, pp. 2018-2025

2003

Simulation and optimization of EJ-MOSFETs


Topic: Nanoelectronics
Publication Type: Article
M. Kittler, R. Granzner, F. Schwierz, W. Henschel, T. Wahlbrink, H. Kurz
Source: Solid State Electronics, Vol. 47 (7) 2003, pp. 1193-1198

2003

PVD Tungsten Gates for SOI-MOSFETs


Topic: Nanoelectronics
Publication Type: Conference Presentation
J. Efavi, M. Lemme, T. Mollenhauer, H. Gottlob, H. Kurz.
Source: EUROMAT 2003, Lausanne/Switzerland, September 2003

2003

Nanoscale SOI-MOSFETs with non-planar Multiple Gates


Topic: Nanoelectronics
Publication Type: Conference Proceedings
M. Lemme, T. Mollenhauer, W. Henschel, T. Wahlbrink, H. Kurz, M. Baus, B. Spangenberg.
Source: Proceedings of 4th European Workshop on Ultimate Integration of Silicon, ULIS 2003, 20-21.03.2003 Udine/Italy, pp. 15-18

2003

Large scale UV-based Nanoimprint lithography


Topic: Nanoimprint Lithography
Publication Type: Article
B. Vratzov, A. Fuchs, M. Lemme, W. Henschel, H. Kurz
Source: Journal of Vacuum Science Technology B, Vol. 21 (6) 2003, pp. 2760-2764

2003

Large Scale UV-based Nanoimprint Lithography


Topic: Nanoimprint Lithography
Publication Type: Conference Presentation
B. Vratzov, A. Fuchs, M. Lemme, W. Henschel and H. Kurz.
Source: EIPBN 2003, Tampa/USA, May 2003

2003

Highly selective HBr etch process for fabrication of Triple-Gate nano-scale SOI-MOSFETs


Topic: Nanoelectronics
Publication Type: Conference Presentation
M.C. Lemme, T. Mollenhauer, H. Gottlob, W. Henschel, J. Efavi, C. Welch, H. Kurz
Source: Micro- and Nano Engineering Conference 2003 (MNE 2003, Cambridge/UK, September, 2003

2003