Two-dimensional (2D) materials have a huge potential for providing devices with much smaller size and extended functionalities with respect to what can be achieved with today’s silicon technologies. But to exploit this potential we must be able to integrate 2D materials into semiconductor manufacturing lines – a notoriously difficult step. A team of researchers from Sweden and Germany now reports a new method to make this work.
The next big challenge in the field of graphene and 2D materials is the development of large-scale fabrication processes compatible with CMOS technology. This challenge will be the topic of a workshop organized in Aachen by AMO GmbH and RWTH Aachen University, on November 12-13, 2019. [read more »]