AMO

Publications

Below you find AMO’s publications resulting from the scientific effort in the different fields of research spanning the time period from 1997 till today. Use the filter to find the publications matching your interest.

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Tungsten Workfunktion Engineering for Dual Metal Gate Nano-CMOS


Topic: Nanoelectronics
Publication Type: Conference Presentation
J.K. Efavi, M.C. Lemme, T. Mollenhauer, T. Wahlbrink, H.D.B. Gottlob, H. Kurz
Source: 5th International Conference on Materials for Microelectronics & Nanoengineering, September 13-14, University of Southampton, UK, 2004

2004

Triple-Gate MOSFETs fabricated with Interference Lithography


Topic: Interference Lithography, Nanoelectronics
Publication Type: Article
M.C. Lemme, C. Moormann, H. Lerch, M. Möller, B. Vratzov, H. Kurz
Source: Nanotechnology, Vol. 15 2004, pp. 208-210

2004

Subthreshold behavior of triple-gate MOSFETs on SOI Material


Topic: Nanoelectronics
Publication Type: Article
M.C. Lemme, T. Mollenhauer, W. Henschel, T. Wahlbrink, M. Baus, O. Winkler, R. Granzner, F. Schwierz, B. Spangenberg, H. Kurz.
Source: Solid State Electronics, Vol. 48 (4) 2004, pp. 529-534

2004

Spatial phase locked combination lithography for photonic crystal device


Topic: Interference Lithography
Publication Type: Article
C. Moormann, J. Bolten, H. Kurz.
Source: Microelectronic Engineering, Vol. 73-74 2004, pp. 417-422

2004

New Materials and Concepts for Nano Transistors


Topic: Nanoelectronics
Publication Type: Conference Presentation
J.K. Efavi, H.D.B. Gottlob, T. Mollenhauer, T. Wahlbrink, M.C. Lemme, H. Kurz (Invited
Source: JUNIOR EUROMAT 2004, September 6-9, Lausanne, Switzerland, 2004

2004

Nanotechnologie – Neue Entwicklungen in Deutschland


Topic: Technology Transfer
Publication Type: Conference Presentation, Invited Paper
M.C. Lemme (invited
Source: NatJa - Die naturwissenschaftliche Vortragsgesellschaft Minden, 12.10.2004

2004

Megasonic-assisted development of nanostructures: first investigations on high aspect ratio nanoholes


Topic: Electron Beam Lithography
Publication Type: Article
David Küpper, Daniel Küpper, Y.M. Georgiev, T. Wahlbrink, W. Henschel, G. Bell, H. Kurz
Source: Appl. Phys. Lett, Vol. 85 (21) 2004, pp. 5055-5057

2004

Large-area patterning for photonic crystals via coherent diffraction


Topic: Nanophotonics
Publication Type: Article
Christel Zanke, Minghao Qi, and Henry I. Smith
Source: Journal of Vacuum Science & Technology B 22(6) 2004, pp. 3352-3355

2004

Investigation of NiAIN as CMOS Gate Material


Topic: Nanoelectronics
Publication Type: Article
J.K. Efavi, M.C. Lemme, T. Mollenhauer, T. Wahlbrink, T. Bobek, D. Wang, H. D.B. Gottlob, H. Kurz
Source: Microelectronic Engineering, Vol. 76 (1-4) 2004, pp. 353-358

2004

Investigation of NiAIN as CMOS Gate Material


Topic: Nanoelectronics
Publication Type: Conference Presentation
J. K. Efavi, M. C. Lemme, T. Mollenhauer, T. Wahlbrink, T. Bobek, D. Wang, H. D. B. Gottlob, H. Kurz
Source: Materials for Advanced Metalization, MAM 04, March 7-10, Brussels/Belgium 2004.

2004

Introduction of Crystalline High-K Gate Dielectrics in a CMOS Process


Topic: Nanoelectronics
Publication Type: Conference Presentation
H.D.B. Gottlob, M.C. Lemme, T. Mollenhauer, T. Wahlbrink, J.K. Efavi, H. Kurz, Y. Stefanov, K. Haberle, R. Komaragiri, T. Ruland, F. Zaunert, U. Schwalke
Source: 5th Symposium: SiO2, Advanced Dielectrics; Related Devices, June 21-23, Chamonix/Switzerland, 2004

2004

Interferometric in-situ aligment for UV-based Nanoimprint


Topic: Nanoimprint Lithography
Publication Type: Conference Presentation
A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Georgiev, H. Kurz
Source: EIPBN San Diego 2004

2004

Interferometric in situ alignment for UV-based nanoimprint


Topic: Nanoimprint Lithography
Publication Type: Article
A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Geogiev and H. Kurz
Source: Journal of Vacuum Science & Technology B, Vol. 22 (6) 2004, pp. 3242-3245.

2004

Highly selective HBr etch process for fabrication of Triple-Gate nano-scale SOI-MOSFETs


Topic: Nanoelectronics
Publication Type: Article
M.C. Lemme, T. Mollenhauer, H. Gottlob, W. Henschel, J. Efavi, C. Welch, H. Kurz
Source: Microelectronic Engineering, Vol 73-74 2004, pp. 346-350

2004

Highly Selective Etch Process for Silicon-On-Insulator Nano-Devices


Topic: Nanoelectronics, Nanophotonics
Publication Type: Conference Presentation
T. Mollenhauer, T. Wahlbrink, Y.M. Georgiev, W. Henschel, J.K. Efavi, H.D.B. Gottlob, M.C. Lemme, H. Kurz, J. Niehusmann, P. Haring Bolivar
Source: Micro- and Nano Engineering Conference 2004, September 19-22, Rotterdam, Netherlands, 2004

2004

High Resolution lithography with PDMS-molds


Topic: Nanoimprint Lithography
Publication Type: Conference Presentation
M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz
Source: EIPBN San Diego 2004

2004

High resolution lithography with PDMS molds


Topic: Nanoimprint Lithography
Publication Type: Article
M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner and F. Lindner (EV Group).
Source: Journal of Vacuum Science & Technology B, Vol. 22 (6) 2004, pp. 3229-3232

2004

Electron Beam Lithography for Applications in Nanotechnology


Topic: Electron Beam Lithography
Publication Type: Conference Presentation
T. Wahlbrink
Source: Ultimate Lithography and Nanodevice Engineering, June 13-16, Agelonde/France, 2004

2004

Electrical characterization of 12 nm EJ-MOSFETs on SOI substrates


Topic: Nanoelectronics
Publication Type: Article
W. Henschel, T. Wahlbrink, Y.M. Georgiev, M. Lemme, T. Mollenhauer, B. Vratzov, A. Fuchs, H. Kurz, M. Kittler, F. Schwierz.
Source: Vacuum, Vol. 77 2005, pp. 117-123

2004

Comparison of Metal Gate Electrodes on MOCVD HfO2


Topic: Nanoelectronics
Publication Type: Conference Presentation
M.C. Lemme, J. K. Efavi, T. Mollenhauer, T. Wahlbrink, H.D.B. Gottlob, H. Kurz
Source: Workshop on Dielectrics in Microelectronics, WODIM 2004, June 28-30, Cork/Ireland, 2004

2004