AMO

Publications

Below you find AMO’s publications resulting from the scientific effort in the different fields of research spanning the time period from 1997 till today. Use the filter to find the publications matching your interest.

Overview of AMO Publications_2014-2019

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Fabrication of Monolithic Bidirectional Switch (MBS) devices with MOS-controlled emitter structures


Topic: Nanoelectronics
Publication Type: Conference Presentation
M. Baus, B.N. Szafranek, St. Chmielus, M.C. Lemme, B. Hadam, B. Spangenberg, R. Sittig, H. Kurz
Source: 18th International Symposium on Power Semiconductor Devices and ICs (ISPSD 2006), Naples/Italy, June 4-8, 2006

2006

CMOS Integration of Epitaxial Gd2O3 High-K Gate Dielectrics


Topic: Nanoelectronics
Publication Type: Article
H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, J. Efavi, M. Schmidt, T. Wahlbrink, M.C. Lemme, H. Kurz, M. Czernohorsky, E. Bugiel, H.-J. Osten, A. Fissel
Source: Solid State Electronics, Vol. 50 (6) 2006, pp. 979-985

2006

Extracting the relative dielectric constant for high-k layers from CV measurements – errors and error propagation


Topic: Nanoelectronics
Publication Type: Conference Presentation
O. Buiu, S. Hall, O. Engstrom, B. Raeissi, M. Lemme, P. K. Hurley, K. Cherkaoui.
Source: WoDiM 2006, 14th Workshop on Dielectrics in Microelectronics, Catania, Italy June 26-28, 2006

2006

Characterization of SOI MOSFETs by means of charge-pumping


Publication Type: Best Paper AwardNanoelectronics, Conference Presentation
Grzegorz Gluszko, Slawomir Szostak, Heinrich Gottlob, Max Lemme, Lidia Lukasiak
Source: 7th, Symposium Diagnostics and Yield Advanced Silicon Devices and Technologies for ULSI Era, Warsaw, Poland, June 26-28, 2006

2006

Epitaxial Oxides as Future High-K Gate Dielectrics


Topic: Nanoelectronics
Publication Type: Conference Presentation
H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, J. Efavi, M. Schmidt, T. Wahlbrink, M.C. Lemme, H. Kurz
Source: IEEE EDS Workshop on Advanced Electron Devices, Duisburg, Germany June 13-14, 2006

2006

Approaches to CMOS integration of epitaxial gadolinium oxide high-K dielectrics


Topic: Nanoelectronics
Publication Type: Conference Proceedings
H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, M. Schmidt, J.K. Efavi, T. Wahlbrink, M.C. Lemme, H. Kurz, R. Endres, Y. Stefanov, U. Schwalke, M. Czernohorsky, E. Bugiel, A. Fissel, H.J. Osten
Source: Proceedings of ESSDERC 2006, pp. 150-153, September 2006

2006

Einfluss des Elektrodenabbrandes auf das Schaltverhalten eines SF6-Selbstblasschalters


Publication Type: External Publication
Robert Karl Dommerque
Source: Dissertation Aachen, Februar 2006.

2006

Approaches to CMOS integration of epitaxial gadolinium oxide high-K dielectrics


Topic: Nanoelectronics
Publication Type: Conference Presentation
H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, M. Schmidt, J.K. Efavi, T. Wahlbrink, M.C. Lemme, H. Kurz, R. Endres, Y. Stefanov, U. Schwalke, M. Czernohorsky, E. Bugiel, A. Fissel, H.J. Osten
Source: ESSDERC 2006, Montreux, Switzerland from September 18-22, 2006

2006

Device Architectures for Nanoscale CMOS: Ultra-Thin SOI, FinFETs and Nanowires


Topic: Nanoelectronics
Publication Type: Conference Presentation
M.C. Lemme, H.D.B. Gottlob, T. Mayer, J. Efavi, M. Schmidt, T. Mollenhauer, T. Wahlbrink, H. Kurz
Source: IEEE EDS Workshop on Advanced Electron Devices, Duisburg, Germany June 13-14, 2006

2006

7th European Workshop on ULtimate Integration of Silicon, ULIS 2006, Grenoble, France April 20-21, 2006


Topic: Nanoelectronics
Publication Type: Conference Proceedings
O. Engström, B. Raeissi, S. Hall, O. Buiu, M.C. Lemme, H.D.B. Gottlob, P.K. Hurley, K. Cherkaoui
Source: 7th European Workshop on ULtimate Integration of Silicon, ULIS 2006, Grenoble, France April 20-21

2006

Comparison of multilayer stamp concepts in UV-NIL


Topic: Nanoimprint Lithography
Publication Type: Article
U. Plachetka, M. Bender, A. Fuchs, T. Wahlbrink,T. Glinsner and H. Kurz
Source: Microelectronic Engineering, Vol 83 (4-9) 2006, pp. 944-947

2006

0.86 nm CET Gate Stacks with Epitaxial Gd2O3 High-K Dielectrics and FUSI NiSi Metal Electrodes


Topic: Nanoelectronics
Publication Type: Article
H.D.B. Gottlob, T. Echtermeyer, M. Schmidt, T. Mollenhauer, J.K. Efavi, T. Wahlbrink, M.C. Lemme, M. Czernohorsky, E. Bugiel, A. Fissel, H.J. Osten, and H. Kurz
Source: IEEE Electron Device Letters, Vol. 27 (10) 2006, pp. 814-816

2006

UV-based Nanoimprint at reduced environmental pressure


Topic: Nanoimprint Lithography
Publication Type: Conference Presentation
A. Fuchs, M. Bender, U. Plachetka, U. Herrmann and H. Kurz
Source: EIPBN Orlando, USA, May 31 - June 03, 2005.

2005

Ultraviolet-based nanoimprint at reduced environmental pressure


Topic: Nanoimprint Lithography
Publication Type: Article
A. Fuchs, M. Bender, U. Plachetka, U. Hermanns and H. Kurz
Source: Journal of Vacuum Science & Technology B, Vol. 23 (6) 2005 pp. 2925-2928

2005

Ultrafast all-optical switching: Photonic engineering of resonator structures with organic nonlinear Kerr materials


Topic: Electron Beam Lithography, Nanophotonics
Publication Type: Article
R.F. Mahrt, N. Moll, S. Gulde, A. Jebali, R. Harbers, S. Joachim, P. Haring-Bolivar, C. Moormann, R. Zamboni and F. Kajzar
Source: Nonlinear Optics, Quantum Optics, Vol. 34 (1-4) 2005.

2005

Tungsten work function engineering for dual metal gate nano-CMOS


Topic: Nanoelectronics
Publication Type: Article
J. K. Efavi, T. Mollenhauer, T. Wahlbrink, H. D. B. Gottlob, M. C. Lemme and H. Kurz
Source: Journal of Materials Science: Materials in Electronics, Volume 16 (7) 2005, pp. 433 - 436

2005

Transistor characteristics of 12 nm Triple-Gate EJ-MOSFETs on SOI-Substrates


Topic: Nanoelectronics
Publication Type: Conference Presentation
T. Wahlbrink, W. Henschel, Y.M. Georgiev, T. Mollenhauer, J.K. Efavi, H.D.B. Gottlob, M.C. Lemme and H. Kurz
Source: ULIS 2005 Conference, Bologna / Italy, April 7 - 8, 2005.

2005

Transistor characteristics of 12 nm Triple-Gate EJ-MOSFETs on SOI-Substrates


Topic: Nanoelectronics
Publication Type: Conference Proceedings
T. Wahlbrink, W. Henschel, Y.M. Georgiev, T. Mollenhauer, J.K. Efavi, H.D.B. Gottlob, M.C. Lemme, H. Kurz
Source: Proceedings of 6th International Conference on Ultimate Integration of Silicon, ULIS 2005, Bologna, Italy April 7 - 8, 2005.

2005

Supercritical drying process for high aspect-ratio HSQ nano-structures


Topic: Electron Beam Lithography
Publication Type: Conference Presentation
T. Wahlbrink, Daniel Küpper, Y.M. Georgiev, J. Bolten, M. Möller, David Küpper, M.C. Lemme, H. Kurz
Source: International Conference on Micro- and Nano-Engineering 2005 (MNE 2005), Vienna, Austria, September 19. - 22., 2005

2005

Status and Prospects of UV-Nanoimprint Technology


Topic: Nanoimprint Lithography
Publication Type: Conference Presentation, Invited Paper
M. Bender, U. Plachetka, A. Fuchs, C. Moormann and H. Kurz
Source: International Conference on Micro- and Nano-Engineering 2005 (MNE 2005), Vienna, Austria, September 19. -22., 2005

2005