Interference lithography (IL) is an optical lithography technique based on holographic principles. In this process, an interference pattern formed by two ultraviolet light beams is transferred into a high-resolution, light-sensitive resist. The resulting patterns are stitching-free and spatially coherent over many square centimeters, and allow realizing structures smaller than 100 nm.
Thanks to its precision, IL technology is particularly well suited for the production of:
- large-area gratings
- periodic nanostructures
- porous surfaces
- photonic crystals
In addition, interference lithography is also used for realizing optical components, masters for nanoimprint and micro-optics, and to create biocompatible surfaces. Furthermore, it is of great relevange for the production of precision measurement tools.
The IL process at AMO is specifically designed for high contrast gratings. Two actively-stabilized interferometers are available for this purpose. We offer flexible exposure and development services for gratings. Structure transfer and further processing are carried out according to individual customer requirements. Different substrate sizes are available. Our process enables anisotropic pattern-transfer. All dimensions of the grating are specified and controlled during and after processing. Line Mapping and Line Edge Roughness (LER) characterization are available upon request.
Further specifications in the Fact-Sheet.