Fact-Sheets & more
AMO offers development and prototyping services in the field of micro- and nanotechnology for applications in electronics, photonics, sensor technology and biotechnology. Here is a brief overview of our competencies and approaches.
AMO operates a Class 10 to Class 1000 cleanroom facility equipped with advanced semiconductor manufacturing equipment. Here is an overview of the existing equipment, which we make available to interested customers and partners as part of our services.
In the context of technology transfer, AMO offers graphene foundry services. We can manufacture customized graphene components as well as assist customers in developing their own manufacturing process. Our experienced team works closely with customers to develop individual solutions tailored to their specific needs. For more information on our graphene foundry services, please download the fact-sheet.
AMO offers research, development and low-volume production of silicon nanophotonic devices and circuits. Our base process covers a wide range of solutions — from single passive nanophotonic chips to 6-inch wafer processing with active nanophotonic devices and two-level metal interconnects. For more information, please see the fact sheet.
AMO offers a wide range of EBL processes for many different substrate types, substrate sizes and applications. More information in the fact-sheet.
Two interference lithography systems are currently installed at AMO: one for extended, high quality, fixed period gratings, and a flexible system for rapid prototyping. We offer fabrication of gratings on silicon, silicon dioxide and other substrates. Period, etch-depth and size fo the gratings are tailored to customer requirements. More information is available in the fact-sheet.
At AMO we offer large area gratings fabricated by interference lithography. This technology allows the production of large area, coherent and periodic gratings with almost constant pitch. We also offer support for further development. In addition, we can produce custom designs with our state-of-the-art e-beam tool (Raith EPG5200) to achieve even higher resolutions (~5nm) and maximum flexibility in design and substrate size. For more information, please see our fact-sheet.
AMO has developed a UV-curing resist (AMONIL®) and a matching adhesion promoter (AMOPRIME) based on many years of experience in nanoimprint. AMONIL® offers an excellent combination of coating and imprint properties, excellent profile accuracy and sufficient plasma stability. These properties make AMONIL® an excellent material for nanoimprint applications where high precision and reliability are required. AMO supports its customers in the application of AMONIL® and AMOPRIME to make the most of their advantages.
AMO is committed to creating a welcoming and inclusive environment where all our employees can achieve their goals and reach their potential. Learn more in our Gender Equality Plan.
